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Analytical models for the thermal strain and stress induced by annular through-silicon-via (TSV)
Wang, Fengjuan, Zhu, Zhangming, Yang, Yintang, Liu, Xiaoxian, Ding, RuixueVolume:
10
Year:
2013
Language:
english
Journal:
IEICE Electronics Express
DOI:
10.1587/elex.10.20130666
File:
PDF, 1.49 MB
english, 2013