Selective etching of HfN gate electrode for HfN/HfSiON gate...

IEICE Electronics Express 2011 Vol. 8; Iss. 18

Selective etching of HfN gate electrode for HfN/HfSiON gate stack in-situ formations

Sano, Takahiro, Ohmi, Shun-ichiro
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Volume:
8
Year:
2011
Language:
english
Journal:
IEICE Electronics Express
DOI:
10.1587/elex.8.1492
File:
PDF, 612 KB
english, 2011
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