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Study of Depth Distribution Shift of Copper on Silicon Wafer Surface Using Total Reflection X-Ray Fluorescence Spectrometry.
MORI, Yoshihiro, SHIMANOE, KengoVolume:
12
Year:
1996
Language:
english
Journal:
Analytical Sciences
DOI:
10.2116/analsci.12.277
File:
PDF, 165 KB
english, 1996