Study of Depth Distribution Shift of Copper on Silicon...

Study of Depth Distribution Shift of Copper on Silicon Wafer Surface Using Total Reflection X-Ray Fluorescence Spectrometry.

MORI, Yoshihiro, SHIMANOE, Kengo
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
12
Year:
1996
Language:
english
Journal:
Analytical Sciences
DOI:
10.2116/analsci.12.277
File:
PDF, 165 KB
english, 1996
Conversion to is in progress
Conversion to is failed