Low-temperature ashing of organic samples containing...

Low-temperature ashing of organic samples containing halogenides by means of carbon dioxide plasma.

MANO, Takako, NAKAMORI, Satomi, HOZUMI, Keiichiro
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Volume:
39
Year:
1990
Journal:
Bunseki kagaku
DOI:
10.2116/bunsekikagaku.39.3_167
File:
PDF, 637 KB
1990
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