![](/img/cover-not-exists.png)
Low-temperature ashing of organic samples containing halogenides by means of carbon dioxide plasma.
MANO, Takako, NAKAMORI, Satomi, HOZUMI, KeiichiroVolume:
39
Year:
1990
Journal:
Bunseki kagaku
DOI:
10.2116/bunsekikagaku.39.3_167
File:
PDF, 637 KB
1990