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Application of high-energy synchrotron-radiation X-ray photoelectron spectroscopy to the depth profile analysis of oxide layer on Si(100) surfaces.
YAMAMOTO, Hiroyuki, BABA, Yuji, A.SASAKI, TeikichiVolume:
45
Year:
1996
Journal:
Bunseki kagaku
DOI:
10.2116/bunsekikagaku.45.169
File:
PDF, 706 KB
1996