Kinetic analysis of polycrystalline silicon growth from silane using a rod-substrate CVD reactor.
Hashimoto, Kenji, Miura, Kouichi, Masuda, Takao, Toma, Masaaki, Sawai, Hiroyuki, Kawase, MotoakiVolume:
16
Year:
1990
Journal:
KAGAKU KOGAKU RONBUNSHU
DOI:
10.1252/kakoronbunshu.16.438
File:
PDF, 1.42 MB
1990