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An analysis of substrate heating during a-Si:H deposition using concentric cylindrical DC glow discharge.
Yamaguchi, Yukio, Konno, Shinji, Muramatu, Kazutami, Makabe, ToshiakiVolume:
16
Year:
1990
Journal:
KAGAKU KOGAKU RONBUNSHU
DOI:
10.1252/kakoronbunshu.16.605
File:
PDF, 1.32 MB
1990