Optimization of Lens Adjustment in Semiconductor...

Journal of Advanced Mechanical Design Systems and Manufacturing 2010 Vol. 4; Iss. 4

Optimization of Lens Adjustment in Semiconductor Lithography Equipment Using Quadratically Constrained and Second-Order Cone Programming

SHINANO, Yuji, YOSHIHARA, Toshiyuki, MIYASHIRO, Ryuhei, FUKAGAWA, Youzou
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Volume:
4
Year:
2010
Language:
english
Journal:
Journal of Advanced Mechanical Design, Systems, and Manufacturing
DOI:
10.1299/jamdsm.4.785
File:
PDF, 256 KB
english, 2010
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