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Characteristics of CVD Silicon Oxide Films Using Nonequilibrium Plasma Chemical Reactions by Silent Discharge. Effect of Discharge Form on Formation and Properties of Films.
ISHIMARU, Kazuhiro, OKAZAKI, KenVolume:
69
Year:
2003
Journal:
Transactions of the Japan Society of Mechanical Engineers Series B
DOI:
10.1299/kikaib.69.115
File:
PDF, 932 KB
2003