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Effect of the Thickness of SiO2 under Layer on the Initial Stage of Epitaxial Growth Process of Yttria-Stabilized Zirconia (YSZ) Thin Film Deposited on Si(001) Substrate.
ISHIGAKI, Hirokazu, YAMADA, Tomoaki, WAKIYA, Naoki, SHINOZAKI, Kazuo, MIZUTANI, NobuyasuVolume:
109
Year:
2001
Language:
english
Journal:
Journal of the Ceramic Society of Japan
DOI:
10.2109/jcersj.109.1273_766
File:
PDF, 4.14 MB
english, 2001