Effect of the Thickness of SiO2 under Layer on the Initial...

Effect of the Thickness of SiO2 under Layer on the Initial Stage of Epitaxial Growth Process of Yttria-Stabilized Zirconia (YSZ) Thin Film Deposited on Si(001) Substrate.

ISHIGAKI, Hirokazu, YAMADA, Tomoaki, WAKIYA, Naoki, SHINOZAKI, Kazuo, MIZUTANI, Nobuyasu
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
109
Year:
2001
Language:
english
Journal:
Journal of the Ceramic Society of Japan
DOI:
10.2109/jcersj.109.1273_766
File:
PDF, 4.14 MB
english, 2001
Conversion to is in progress
Conversion to is failed