Highly Selective Response of Dopamine Against its Metabolite and Interfering Molecules at Sputtered ITO Electrode Surface
NIWA, Osamu, XU, Guobao, IWASAKI, YuzuruVolume:
74
Year:
2006
Language:
english
Journal:
Electrochemistry
DOI:
10.5796/electrochemistry.74.135
File:
PDF, 516 KB
english, 2006