Molecular dynamics study on fluorine radical multilayer...

Japanese Journal of Applied Physics 2016 / 11 Vol. 55; Iss. 11

Molecular dynamics study on fluorine radical multilayer adsorption mechanism during Si, SiO 2 , and Si 3 N 4 etching processes

Numazawa, Satoshi, Machida, Ken, Isobe, Michiro, Hamaguchi, Satoshi
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Volume:
55
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.55.116204
Date:
November, 2016
File:
PDF, 872 KB
english, 2016
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