![](/img/cover-not-exists.png)
First-Principles-Calculation Method for Optimizing Strain to Reduce Gate Leakage Current in MOS Transistors with Silicon Oxynitride Gate Dielectrics
KANEGAE, Yoshiharu, MORIYA, Hiroshi, IWASAKI, TomioVolume:
48
Year:
2005
Language:
english
Journal:
JSME International Journal Series A
DOI:
10.1299/jsmea.48.14
File:
PDF, 807 KB
english, 2005