Stress engineering of the alkoxide derived ferroelectric...

Journal of the Ceramic Society of Japan 2009 Vol. 117; Iss. 1370

Stress engineering of the alkoxide derived ferroelectric thin film on Si wafer

OHNO, Tomoya, MALIČ, Babara, FUKAZAWA, Hiroaki, WAKIYA, Naoki, SUZUKI, Hisao, MATSUDA, Takeshi, KOSEC, Marija
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Volume:
117
Year:
2009
Language:
english
Journal:
Journal of the Ceramic Society of Japan
DOI:
10.2109/jcersj2.117.1089
File:
PDF, 728 KB
english, 2009
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