FABRICATION OF MOS-CAPACITORS WITH Ta2O5, SiO2 AND ALKALI METAL-FREE PHOSPHATE GLASS FILMS DEPOSITED BY RF-SPUTTERING AND THEIR APPLICATION TO MEASURE THE ADSORPTION OF PROTON AND ANIONS
MASUI, KANJI, NOMURA, TSUYOSHI, HAYASHI, YOUSUKEVolume:
7
Year:
1991
Language:
english
Journal:
Analytical Sciences
DOI:
10.2116/analsci.7.supple_1703
File:
PDF, 394 KB
english, 1991