Determination of impurities in silicon nitride by inductively coupled plasma emission spectrometry.
ISHIZUKA, Toshio, UWAMINO, Yoshinori, TSUGE, AkiraVolume:
33
Year:
1984
Journal:
Bunseki kagaku
DOI:
10.2116/bunsekikagaku.33.9_486
File:
PDF, 807 KB
1984