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Si Atom Movement on a-Si Film Surface by Soft X-ray Excitation Using Undulators Source
Matsuo, Naoto, Takanashi, Yasuyuki, Heya, Akira, Kanda, KazuhiroVolume:
73
Year:
2009
Journal:
Journal of the Japan Institute of Metals
DOI:
10.2320/jinstmet.73.708
File:
PDF, 853 KB
2009