Tungsten selective CVD and its applications to VLSI...

Bulletin of the Japan Institute of Metals 1989 Vol. 28; Iss. 1

Tungsten selective CVD and its applications to VLSI metallization.

Itoh, Hitoshi, Moriya, Takahiko
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Volume:
28
Year:
1989
Journal:
Bulletin of the Japan Institute of Metals
DOI:
10.2320/materia1962.28.48
File:
PDF, 6.62 MB
1989
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