Dissolution Kinetics and PAG Interaction of Phenolic Resins...

Journal of Photopolymer Science and Technology 1997 Vol. 10; Iss. 3

Dissolution Kinetics and PAG Interaction of Phenolic Resins in Chemically Amplified Resists.

Ito, Hiroshi, Alexander, Debra-Fenzel, Breyta, Greg
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Volume:
10
Year:
1997
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.10.397
File:
PDF, 693 KB
english, 1997
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