High-sensitive Negative Resist Materials Based on...

Journal of Photopolymer Science and Technology 2000 Vol. 13; Iss. 3

High-sensitive Negative Resist Materials Based on Polysilane Derivatives.

Seki, Shu, Kunimi, Yoshihisa, Sakurai, Yusuke, Tsuji, Shou, Maeda, Kensaku, Tagawa, Seiichi
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Volume:
13
Year:
2000
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.13.395
File:
PDF, 137 KB
english, 2000
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