Highly-Efficient Photoacid Generators for ArF Resist.
Kajita, Toru, Ishii, Hiroyuki, Usui, Shinji, Douki, Katsuji, Chawanya, Hitoshi, Shimokawa, TsutomuVolume:
13
Year:
2000
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.13.625
File:
PDF, 189 KB
english, 2000