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Relationship between the Thermal Hardening of Ion-Implanted Resist and the Resist Removal Using Atomic Hydrogen
Maruoka, Takeshi, Goto, Yousuke, Yamamoto, Masashi, Horibe, Hideo, Kusano, Eiji, Takao, Kazuhisa, Tagawa, SeiichiVolume:
22
Year:
2009
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.22.325
File:
PDF, 452 KB
english, 2009