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Synthesis and Evaluation of Adamantane-Containing Fluorinated Block Copolymers for Resist Modifers in Immersion Lithography
Kanno, Miki, Otake, Atsushi, Tsuchiya, Kousuke, Ogino, KenjiVolume:
24
Year:
2011
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.24.361
File:
PDF, 284 KB
english, 2011