Materials Development to Extend ArF Lithography Toward...

Materials Development to Extend ArF Lithography Toward Sub-20nm Patterning

Kimura, Toru
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Volume:
25
Year:
2012
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.25.115
File:
PDF, 593 KB
english, 2012
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