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Sensitivity enhancement of t-BOC based chemically amplified resists through optimization of process prebake conditions.
Novembre, A. E., Kometani, J. M., Tai, W. W., Reichmanis, E., Thompson, L. F., Hanson, J. E.Volume:
5
Year:
1992
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.5.9
File:
PDF, 261 KB
english, 1992