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Molecular Design of Acid Generators for EB and ArF Excimer Laser Exposure Using Molecular Orbital Calculations.
Ushirogouchi, Tohru, Kihara, Naoko, Saito, Satoshi, Naito, Takuya, Asakawa, Koji, Tada, Tsukasa, Nakase, MakotoVolume:
7
Year:
1994
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.7.423
File:
PDF, 427 KB
english, 1994