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Resists Using the Absorption Band Shift Method for ArF Excimer Laser Lithography.
Okino, Takeshi, Asakawa, Koji, Shida, Naomi, Ushirogouchi, TohruVolume:
11
Year:
1998
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.11.489
File:
PDF, 231 KB
english, 1998