Fluoroaromatic Resists for 157-nm Lithography.
Fedynyshyn, Theodore H., Kunz, Roderick R., Sinta, Roger F., Sworin, Michael, Mowers, William A., Goodman, Russell B., Cabral, AlbertoVolume:
15
Year:
2002
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.15.655
File:
PDF, 2.01 MB
english, 2002