Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists.
Crawford, M. K., Farnham, W. B., Feiring, A. E., Feldman, J., French, R. H., Leffew, K. W., Petrov, V. A., Schadt III, F. L., Zumsteg, F. C.Volume:
15
Year:
2002
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.15.677
File:
PDF, 1.93 MB
english, 2002