Development of Silicon Containing Resists for sub-100nm...

Journal of Photopolymer Science and Technology 2004 Vol. 17; Iss. 4

Development of Silicon Containing Resists for sub-100nm Lithography

Hatakeyama, Jun, Takeda, Takanobu, Nakashima, Mutsuo, Kinsho, Takeshi, Kawai, Yoshio, Ishihara, Toshinobu
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Volume:
17
Year:
2004
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.17.519
File:
PDF, 640 KB
2004
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