The Need of Top Anti-reflective Coating Materials for ArF Immersion Lithography
Jung, Jae Chang, Lee, Geunsu, Lee, Sung Koo, Ban, Keun Do, Bok, Cheolkyu, Moon, Seung ChanVolume:
18
Year:
2005
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.18.627
File:
PDF, 553 KB
2005