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Negative-Tone Polyphenol Resist using Intramolecular-Esterification Reaction for sub-50 nm Lithography
Kojima, Kyoko, Hattori, Takashi, Fukuda, Hiroshi, Hirayama, Taku, Shiono, Daiji, Hada, Hideo, Onodera, JunichiVolume:
19
Year:
2006
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.19.373
File:
PDF, 1.71 MB
2006