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Numerical Analyses of the Roles of Gas Phase and Liquid Phase UV Photochemistry in Conventional and Immersion 193 nm Lithography
Hinsberg, William, Houle, Francis A.Volume:
19
Year:
2006
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.19.623
File:
PDF, 3.28 MB
2006