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Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism
Kryask, Marie, Trikeriotis, Markos, Ouyang, Christine, Chakrabarty, Sovik, Giannelis, Emmanuel P., Ober, Christopher K.Volume:
26
Year:
2013
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.26.659
File:
PDF, 254 KB
english, 2013