A new chemical amplification resist system based on novolac and t-BOC protected phosphazene as a dissolution inhibitor.
AHN, KWANG-DUK, KANG, JONG-HEE, KIM, SEONG-JU, PARK, BYUNG-SUN, PARK, CHAN-EON, PARK, CHUN-GEUNVolume:
5
Year:
1992
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.5.67
File:
PDF, 459 KB
english, 1992