Effects of Molecular-Weight Distributions of Resist Polymers and Process Control on Lithography for 0.1.MU.m and Below.
Yoshimura, Toshiyuki, Yamamoto, Jiro, Shiraishi, Hiroshi, Uchino, Shou-ichi, Terasawa, Tsuneo, Mural, Fumio, Okazaki, ShinjiVolume:
10
Year:
1997
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.10.629
File:
PDF, 438 KB
english, 1997