Cyclization Reaction in Acrylonitrile-Contained Acrylic Copolymers and Its Possible Application for the Improvement of Dry Etch Resistance for Photoresists.
Zhao, Wenwei, Sakurai, Yusuke, Ohfuji, Takeshi, Sasago, Masaru, Tagawa, SeiichiVolume:
11
Year:
1998
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.11.525
File:
PDF, 442 KB
english, 1998