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Radiation Chemistry of Triphenylsulfonium Salts in EB and X-Ray Chemically Amplified Resists-Proton Generation Mechanisms.
Nagahara, Seiji, Kozawa, Takahiro, Yamamoto, Yukio, Tagawa, SeiichiVolume:
11
Year:
1998
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.11.577
File:
PDF, 270 KB
english, 1998