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Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists
Yamachika, Mikio, Patterson, Kyle, Cho, Sungseo, Rager, Timo, Yamada, Shintaro, Byers, Jeffrey, Paniez, P. J., Mortini, B., Gally, S., Sassoulas, P-O., Willson, C. GrantVolume:
12
Year:
1999
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.12.553
File:
PDF, 534 KB
english, 1999