High etch-resistant EB resists employing adamantyl...

Journal of Photopolymer Science and Technology 2000 Vol. 13; Iss. 3

High etch-resistant EB resists employing adamantyl protective groups and their application for 248-nm lithography.

Nozaki, Koji, Kon, Jun-ichi, Yano, Ei
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Volume:
13
Year:
2000
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.13.397
File:
PDF, 376 KB
english, 2000
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