Postexposure Delay Effect in Chemically Amplified Resists.

Journal of Photopolymer Science and Technology 2001 Vol. 14; Iss. 3

Postexposure Delay Effect in Chemically Amplified Resists.

Kim, Jin-Baek, Kwon, Young-Gil, Yun, Hyo-Jin, Jung, Min-Ho
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Volume:
14
Year:
2001
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.14.401
File:
PDF, 401 KB
english, 2001
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