New Antireflective Coating Materials Containing a Novel Chromophore for KrF Laser Lithography.
Ahn, Kwang-Duk, Han, Dong Keun, Kim, Jun-Young, Ha, Seong-Hyun, Lee, Dae-Youp, Nam, Jeong-LimVolume:
14
Year:
2001
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.14.475
File:
PDF, 270 KB
english, 2001