Influence of Acid Diffusion Length on Line Edge Roughness...

Influence of Acid Diffusion Length on Line Edge Roughness in KrF Photoresists

Kim, Jae Hyun, Kim, Yong-Ho, Chon, Sang Mun, Nagai, Tomoki, Noda, Masahiro, Yamaguchi, Yoshikazu, Makita, Yutaka, Nemoto, Hiroaki
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Volume:
17
Year:
2004
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.17.379
File:
PDF, 454 KB
2004
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