![](/img/cover-not-exists.png)
Influence of Acid Diffusion Length on Line Edge Roughness in KrF Photoresists
Kim, Jae Hyun, Kim, Yong-Ho, Chon, Sang Mun, Nagai, Tomoki, Noda, Masahiro, Yamaguchi, Yoshikazu, Makita, Yutaka, Nemoto, HiroakiVolume:
17
Year:
2004
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.17.379
File:
PDF, 454 KB
2004