Approaches for 193nm and 248nm First and Second Generation...

Approaches for 193nm and 248nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)

Houlihan, Francis, Miyazaki, Shinji, Dioses, Alberto, Zhang, Lin, Ubayashi, Yuki, Ohta, Kazuyoshi, Oberlander, Joseph, Krawicz, Alexandra, Vasanthan, Sumathy, Li, Meng, Wei, Yayi, Lu, PingHung, Neisse
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Volume:
21
Year:
2008
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.21.383
File:
PDF, 859 KB
english, 2008
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