Removal of Ion Implanted Resists with Various Acceleration...

Removal of Ion Implanted Resists with Various Acceleration Energy using Wet Ozone

Goto, Yousuke, Maruoka, Takeshi, Yamamoto, Masashi, Horibe, Hideo, Kusano, Eiji, Miura, Toshinori, Kekura, Mituru, Tagawa, Seiichi
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Volume:
22
Year:
2009
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.22.321
File:
PDF, 410 KB
english, 2009
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