Status of EUV Resist and Process Development at IC Manufacture to Implement EUV Lithography to 2X DRAM and Beyond
Kim, Hyun-Woo, Na, Hai-Sub, Park, Chang-Min, Park, Cheolhong, Kim, Sumin, Koh, Chawon, Kim, In-Sung, Cho, Han-KuVolume:
24
Year:
2011
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.24.119
File:
PDF, 1.21 MB
english, 2011