Structural Changes of Photoresist on Wafer Studied by...

Journal of Photopolymer Science and Technology 2014 Vol. 27; Iss. 1

Structural Changes of Photoresist on Wafer Studied by Pyrolysis-GC/MS Combined with Micro-GPC

Taguchi, Yoshihiko, Kawai, Kazuki, Otsuki, Akiko, Man, Naoki, Mochida, Kenji, Nakamura, Shinichi, Kimura, Tooru
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Volume:
27
Year:
2014
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.27.41
File:
PDF, 640 KB
english, 2014
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