Improvement of Post Exposure Delay of Photo-Patternable and...

Journal of Photopolymer Science and Technology 2015 Vol. 28; Iss. 3

Improvement of Post Exposure Delay of Photo-Patternable and Adhesive Materials for Wafer-Scale Microfluid

Kubo, Hiroto, Doi, Takashi, Nishimura, Isao, Hayashi, Eiji, Hieda, Katsuhiko, Peters, Sara, Vanroosbroeck, Ruben
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Volume:
28
Year:
2015
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.28.411
File:
PDF, 924 KB
english, 2015
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