Relationship between Thermalization Distance and Line Edge...

Relationship between Thermalization Distance and Line Edge Roughness in Sub-10 nm Fabrication Using Extreme Ultraviolet Lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
28
Year:
2015
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.28.669
File:
PDF, 250 KB
english, 2015
Conversion to is in progress
Conversion to is failed