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Relationship between Thermalization Distance and Line Edge Roughness in Sub-10 nm Fabrication Using Extreme Ultraviolet Lithography
Kozawa, Takahiro, Santillan, Julius Joseph, Itani, ToshiroVolume:
28
Year:
2015
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.28.669
File:
PDF, 250 KB
english, 2015