Studies on the acid formation and deprotection reaction by...

Studies on the acid formation and deprotection reaction by novel sulfonates in a chemical amplification positive photoresist.

Schlegel, Leo, Ueno, Takumi, Shiraishi, Hiroshi, Hayashi, Nobuaki, Iwayanagi, Takao
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
3
Year:
1990
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.3.281
File:
PDF, 314 KB
english, 1990
Conversion to is in progress
Conversion to is failed