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Studies on the acid formation and deprotection reaction by novel sulfonates in a chemical amplification positive photoresist.
Schlegel, Leo, Ueno, Takumi, Shiraishi, Hiroshi, Hayashi, Nobuaki, Iwayanagi, TakaoVolume:
3
Year:
1990
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.3.281
File:
PDF, 314 KB
english, 1990